Compact, dry-lubricating, and low-maintenance

For DUV lithography, Steinmeyer has developed an ultra-compact, high-precision positioning solution for wafer exposure in a dry, oxygen-free nitrogen atmosphere at its Dresden site, Europe's largest ICT/microelectronics center. The innovative assembly is designed as an optional add-on for integration into an existing machine and sets standards in terms of compactness, reliability and low particle count.

Thanks to its broad technological expertise, comprehensive engineering expertise, deep application understanding and wealth of experience, the Steinmeyer Group is a sought-after partner in the design, development and manufacture of sophisticated positioning solutions for wafer and chip production. A prime example of the high level of solution expertise at the Dresden site is the additional polarization filter for miniaturization and automation in DUV lithography.

Additional polarization filter for DUV lithography

The DUV polarization filter is extremely compact with dimensions of approx. 120 x 180 x 31 mm. Three flat filters are housed at a height of just 15 mm. These are moved in the beam path of the optical system and can be positioned independently of one another. The desired filter properties are determined by the relative position of the three filters. The drive is carried out by means of a sliding screw drive (stroke 75 mm) and electronically commutated DC motors. Each filter has its own drive train, which is covered with a steel sheet to protect against DUV radiation. The system runs dry, enables accuracies of up to 1.5 µm and offers maintenance-free and flexible 24/7 operation over many 1,000 setting cycles (spread over 10 years).

Extremely low-particle sliding screw drive

The miniature sliding screw drive is the heart of the assembly. It was developed at the Suhl site specifically for applications in DUV lithography and, with a spindle diameter of just 3 mm and a spindle length of 112 mm, is one of the smallest on the market in terms of precision. The innovative material combination - the nut is made of the high-performance plastic PEEK and the spindle is made of stainless steel - enables optimal sliding properties, heat dissipation and mechanical stability even under extreme environmental conditions in DUV lithography.

Sought-after partner of the semiconductor industry

Whether handling, inspection or assembly, whether HV, UHV or EUV positioning: Steinmeyer has decades of experience in the design and manufacture of positioning systems for semiconductor applications and has special know-how in tribology and lubrication in dry, oxygen-free atmospheres such as vacuum and pure nitrogen. This enables the group of companies to implement reliable, economical solutions even for challenging tasks. The tried and tested systems are customized to the application-specific requirements - from the test laboratory to the automated semiconductor factory up to ISO 14644-1 to Class 1.

All production parts are designed to be vacuum-compatible and cleaned separately after production. Assembly takes place in a certified ISO Class 6 cleanroom. Variable room capacities of more than 3,900 m² ensure exceptional flexibility. An extension of the cleanroom will be completed next year. Cleanroom-compliant packaging filled with nitrogen inert gas protects the finished product during transport.